Is this a first for NVIDIA, or do they have prior experience in this field? They are involved in so many industries, but this was the first time I can recall of them mentioning anything lithography related.
Honestly, I would think the GPUs probably are already in use to a large extent in mask fabrication. Using Nvidia examples, it could take 178 weeks produce the masks needed for H100 in sequence with CPU onlys. Thats too time consuming.
Also, I remember watching a presentation by a company called D2S talking about using gpu acceleration for curvilinear mask. That’s more than a year ago I think. So I think it’s had already been in use. Perhaps nvidia is doing some software heavy lifting here.
Thank you for breaking this down Dr. C!
Very interesting and hope it plays a bigger role for High-NA EUV as the industry transitions from 0.33 NA to 0.55 NA.
Is this a first for NVIDIA, or do they have prior experience in this field? They are involved in so many industries, but this was the first time I can recall of them mentioning anything lithography related.
Honestly, I would think the GPUs probably are already in use to a large extent in mask fabrication. Using Nvidia examples, it could take 178 weeks produce the masks needed for H100 in sequence with CPU onlys. Thats too time consuming.
Also, I remember watching a presentation by a company called D2S talking about using gpu acceleration for curvilinear mask. That’s more than a year ago I think. So I think it’s had already been in use. Perhaps nvidia is doing some software heavy lifting here.